Gordon E. Moore, "Cramming more components onto integrated circuits", Electronics, V. 38, N. 8, April 19, 1965, S.114 ff.

"The complexity for minimum component costs has increased at a rate of roughly a factor of two per year", ibid.

Gordon E. Moore, "Progress In Digital Integrated Electronics", Technical Digest, IEEE International Electron Devices Meeting, 1975, S. 11-13.

Tom R. Halfhill, "The Mythology of Moore’s Law", IEEE SSCS Newsletter, Sept. 2006, S. 21-25.

Thomas Lee, "Leap for Microchips", Scientific American, Januar 2002, S. 52-59.

R. Hudyma, W. Ulrich, H-J. Rostalski, Compact 1½-waist system for sub 100 nm ArF lithography, United States Patent 6906866, Carl Zeiss SMT AG, 2005

. Matsuyama, Y. Ohmura, D. Williamson, "The Lithographic Lens: its history and evolution", Optical Microlithography XIX, Donis G. Flagello (Ed.), Proc. of SPIE, V. 6154, 2006.

G. Stix, "Shrinking Circuits with Water", Scientific American, Juli 2005, S. 64-67.

M. Yang, S. Kaplan, R. French, J. Burnett, "Index of refraction of high-index lithographic immersion fluids and its variability", J. Micro/Nanolith. MEMS MOEMS 8(2), 023005, Apr-Jun 2009.

M. Fritze, B. Tyrrell, D. Astolfi, R. Lambert, D. Yost, A. Forte S. Cann, B. Wheeler, "Subwavelength Optical Lithography with Phase-Shift Photomasks", Lincoln Laboratory Journal, V. 14, N. 2, 2003, S. 237-250.

C. Mack, "Seeing Double", IEEE Spectrum, September 2008.

X. Ma, G. Arce, Computational Lithography, John Wiley & Sons, 6. Auflage, August 2010.

S.R.J. Brueck, "There are NO Fundamental Limits to Optical Nanolithography", in: A. Guenther (Hrsg.), International Trends in Applied Optics, SPIE, 2002, S. 85-109

S. Das, "Ohm’s Law Survives at the Atomic Scale", IEEE Spectrum, Januar 2012.

Fab 32 - Intel's first high-volume 45nm chip factory